Dimensions and Shapes of Block Copolymer Domains Assembled on Lithographically Defined Chemically Patterned Substrates
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- 作者：Erik W. Edwards ; Marcus Mü ; ller ; Mark P. Stoykovich ; Harun H. Solak ; Juan J. de Pablo ; Paul F. Nealey
- 刊名：Macromolecules
- 出版年：2007
- 出版时间：January 9, 2007
- 年：2007
- 卷：40
- 期：1
- 页码：90 - 96
- 全文大小：996K
- 年卷期：v.40,no.1(January 9, 2007)
- ISSN：1520-5835
文摘
Thin films of a nearly symmetric lamellae-forming diblock copolymer of poly(styrene-b-methylmethacrylate) (PS-b-PMMA) having a bulk repeat period, LO, were directed to assemble vertically away fromchemically nanopatterned striped substrates (having a periodicity LS) that consisted of alternating stripes thatwere preferentially wet by the two blocks of the copolymer. The relative widths of the adjacent stripes weresystematically varied such that the normalized line width of the chemical surface pattern, defined as the width ofthe stripe that was wet by the styrene block of the block copolymer, W, divided by the constant chemical surfacepattern period, Ls had values between 0.30 and 0.65. On chemical surface patterns with LS 
LO the diblockcopolymer domains formed defect-free perpendicular arrays if the normalized line width W/LS, was between0.36 and 0.63. On chemical surface patterns with LS 
LO, the range of W/LS capable of inducing defect freearrays decreased as the difference between LS and LO increased. Single-chain-in-mean-field (SCMF) simulationsprovided information on the dimensions and shapes of the block copolymer domains. The SCMF simulationsindicated that the widths of the lamellae at half film thickness were 0.47LS independent of W/LS and the angleof the interface between the vertically oriented domains remained within 11
of the substrate normal over therange of experimentally relevant values of W/LS.
LO the diblockcopolymer domains formed defect-free perpendicular arrays if the normalized line width W/LS, was between0.36 and 0.63. On chemical surface patterns with LS LO, the range of W/LS capable of inducing defect freearrays decreased as the difference between LS and LO increased. Single-chain-in-mean-field (SCMF) simulationsprovided information on the dimensions and shapes of the block copolymer domains. The SCMF simulationsindicated that the widths of the lamellae at half film thickness were 0.47LS independent of W/LS and the angleof the interface between the vertically oriented domains remained within 11 of the substrate normal over therange of experimentally relevant values of W/LS.