In Situ X-ray Fluorescence Measurements During Atomic Layer Deposition: Nucleation and Growth of TiO2 on Planar Substrates and in Nanoporous Films

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• 作者：Jolien Dendooven ; Sreeprasanth Pulinthanathu Sree ; Koen De Keyser ; Davy Deduytsche ; Johan A. Martens ; Karl F. Ludwig ; Christophe Detavernier
• 刊名：Journal of Physical Chemistry C
• 出版年：2011
• 出版时间：April 14, 2011
• 年：2011
• 卷：115
• 期：14
• 页码：6605-6610
• 全文大小：905K
• 年卷期：v.115,no.14(April 14, 2011)
• ISSN：1932-7455

文摘

Synchrotron-based X-ray fluorescence (XRF) is introduced as a promising in situ technique to monitor atomic layer deposition cycle-per-cycle. It is shown that the technique is greatly suitable to study initial nucleation on planar substrates. The initial growth of TiO₂ from tetrakis(dimethylamino)titanium (TDMAT) and H₂O is found to be linear on thermally grown SiO₂, substrate-inhibited on H-terminated Si and substrateenhanced on atomic layer deposited Al₂O₃. Furthermore, in situ XRF is employed to monitor the Ti uptake during deposition of TiO₂ in nanoporous silica films. In mesoporous films, the Ti content varied quadratically with the number of cycles, a behavior that is attributed to a decreasing surface area with progressing deposition. In microporous films, the XRF data suggest that 1鈭? ALD cycles shrunk the pore diameters below the kinetic diameter of the TDMAT molecule.