Adsorption and Reactions of NO on Clean and CO-Precovered Ir(111)

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• 作者：Tadahiro Fujitani ; Isao Nakamura ; Yukihiro Kobayashi ; Atsushi Takahashi ; Masaaki Haneda ; and Hideaki Hamada
• 刊名：Journal of Physical Chemistry B
• 出版年：2005
• 出版时间：September 22, 2005
• 年：2005
• 卷：109
• 期：37
• 页码：17603 - 17607
• 全文大小：130K
• 年卷期：v.109,no.37(September 22, 2005)
• ISSN：1520-5207

文摘

Adsorption and reactions of NO on clean and CO-precovered Ir(111) were investigated by means of X-rayphotoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HR-EELS), infraredreflection absorption spectroscopy (IRAS), and temperature-programmed desorption (TPD). Two NO adsorptionstates, indicative of fcc-hollow sites and atop sites, were present on the Ir(111) surface at saturation coverage.NO adsorbed on hollow sites dissociated to N_a and O_a at temperatures above 283 K. The dissociated N_adesorbed to form N₂ by recombination of N_a at 574 K and by a disproportionation reaction between atop-NOand N_a at 471 K. Preadsorbed CO inhibited the adsorption of NO on atop sites, whereas adsorption on hollowsites was not affected by the coexistence of CO. The adsorbed CO reacted with dissociated O_a and desorbedas CO₂ at 574 K.