Dual Patterning of a Poly(acrylic acid) Layer by Electron-Beam and Block Copolymer Lithographies
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- 作者：Anthony C. Pearson ; Matthew R. Linford ; John N. Harb ; Robert C. Davis
- 刊名：Langmuir
- 出版年：2013
- 出版时间：June 18, 2013
- 年：2013
- 卷：29
- 期：24
- 页码：7433-7438
- 全文大小：347K
- 年卷期：v.29,no.24(June 18, 2013)
- ISSN：1520-5827
文摘
We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is spun cast onto the surface. A short reactive ion etch is then used to transfer the micelle pattern into the patterned poly(acrylic acid) . Finally, PdCl2 is loaded from solution into the patterned poly(acrylic acid) features, and a reactive-ion etching process is used to remove the remaining polymer and form Pd nanoparticles. This method yields location-controlled patches of nanoparticles, including single- and double-file lines and nanoparticle pairs. A locational accuracy of 9 nm or less in one direction was achieved by optimizing the size of the PAA features.