Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam

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• 作者：Daniel S. Fox ; Yangbo Zhou ; Pierce Maguire ; Arlene O鈥橬eill ; Cormac 脫鈥機oile谩in ; Riley Gatensby ; Alexey M. Glushenkov ; Tao Tao ; Georg S. Duesberg ; Igor V. Shvets ; Mohamed Abid ; Mourad Abid ; Han-Chun Wu ; Ying Chen ; Jonathan N. Coleman ; John F. Donegan ; Hongzhou Zhang
• 刊名：Nano Letters
• 出版年：2015
• 出版时间：August 12, 2015
• 年：2015
• 卷：15
• 期：8
• 页码：5307-5313
• 全文大小：444K
• ISSN：1530-6992

文摘

We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS₂) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS₂ was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He⁺. Amorphous MoS_x with metallic behavior has been demonstrated for the first time. Fabrication of MoS₂ nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.