Selective Photobleaching of (-Ag-O-) Strings on the Ag(110) Surface
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- 作者：Yuji Matsumoto ; Yuji Okawa ; Kenji Suzuki ; Kozo Mukai ; and Ken-ichi Tanaka
- 刊名：Journal of the American Chemical Society
- 出版年：1996
- 出版时间：October 9, 1996
- 年：1996
- 卷：118
- 期：40
- 页码：9676 - 9679
- 全文大小：130K
- 年卷期：v.118,no.40(October 9, 1996)
- ISSN：1520-5126
文摘
A p(2×3)-N Ag(110) surface obtained by N+and/or N2+ ion bombardment gave a desorptionpeak of N2at 530 K. When this p(2×3)-N Ag(110) surface was exposed toO2 at room temperature, the LEED patternshoweda combined structure of [p(2×3)-N + p(2×1)-O]. The STMimage proved the growth of the (-Ag-O-) and(Ag2N) strings in the [001] and [1
0] directions,respectively. The TPD spectrum of the combined surface gavethedesorption of N2 at 530 K, NO at 490-520 K, andO2 at 600 K. When this [p(2×3)-N + p(2×1)-O]Ag(110)surface was illuminated with a UV light at room temperature, the(-Ag-O-) strings in the STM image wereselectively erased although the (Ag2N) underwent littleinfluence, and the LEED pattern changed to the p(2×3)-Nstructure. The TPD spectrum of the surface after the illuminationgave only N2. These results indicate thatsurfacemigration of N atoms triggers the reaction between N and N yieldingN2 as well as N and O yielding NO on thesurface. Selective photobleaching for the combined structure maysuggest a feasibility of atomic scale lithographyof the surface by using photochemical reactions.
0] directions,respectively. The TPD spectrum of the combined surface gavethedesorption of N2 at 530 K, NO at 490-520 K, andO2 at 600 K. When this [p(2×3)-N + p(2×1)-O]Ag(110)surface was illuminated with a UV light at room temperature, the(-Ag-O-) strings in the STM image wereselectively erased although the (Ag2N) underwent littleinfluence, and the LEED pattern changed to the p(2×3)-Nstructure. The TPD spectrum of the surface after the illuminationgave only N2. These results indicate thatsurfacemigration of N atoms triggers the reaction between N and N yieldingN2 as well as N and O yielding NO on thesurface. Selective photobleaching for the combined structure maysuggest a feasibility of atomic scale lithographyof the surface by using photochemical reactions.