Performance Synthesis of Multiple Input鈭扢ultiple Output (MIMO) Exponentially Weighted Moving Average (EWMA) Run-to-Run Controllers with Metrology Delay

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• 作者：Richard Good ; S. Joe Qin
• 刊名：Industrial & Engineering Chemistry Research
• 出版年：2011
• 出版时间：February 2, 2011
• 年：2011
• 卷：50
• 期：3
• 页码：1400-1409
• 全文大小：350K
• 年卷期：v.50,no.3(February 2, 2011)
• ISSN：1520-5045

文摘

The increased demand on throughput in semiconductor manufacturing often leads to a lag between the processing and metrology of wafers at a manufacturing step. This metrology lag results in a detrimental impact on the performance of a process under run-to-run control. This paper analyzes the performance of processes under exponentially weighted moving average (EWMA) run-to-run control by considering time-delayed closed-loop processes with mismatch between the process and the process model. The closed-loop performance bounds for EWMA controlled processes with delays of 0鈭? runs are derived using modified stability analysis tools. Several simulations are provided to illustrate the importance of considering metrology delay and plant鈭抦odel mismatch explicitly in controller performance and tuning.