Vapor鈥揕iquid鈥揝olid Etch of Semiconductor Surface Channels by Running Gold Nanodroplets

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• 作者：Babak Nikoobakht ; Andrew Herzing ; Shin Muramoto ; Jerry Tersoff
• 刊名：Nano Letters
• 出版年：2015
• 出版时间：December 9, 2015
• 年：2015
• 卷：15
• 期：12
• 页码：8360-8364
• 全文大小：352K
• ISSN：1530-6992

文摘

We show that Au nanoparticles spontaneously move across the (001) surface of InP, InAs, and GaP when heated in the presence of water vapor. As they move, the particles etch crystallographically aligned grooves into the surface. We show that this process is a negative analogue of the vapor鈥搇iquid鈥搒olid (VLS) growth of semiconductor nanowires: the semiconductor dissolves into the catalyst and reacts with water vapor at the catalyst surface to create volatile oxides, depleting the dissolved cations and anions and thus sustaining the dissolution process. This VLS etching process provides a new tool for directed assembly of structures with sublithographic dimensions, as small as a few nanometers in diameter. Au particles above 100 nm in size do not exhibit this process but remain stationary, with oxide accumulating around the particles.