Self-Terminating Protocol for an Interfacial Complexation Reaction in Vacuo by Metal鈥揙rganic Chemical Vapor Deposition
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- 作者：Anthoula C. Papageorgiou ; Sybille Fischer ; Seung Cheol Oh ; 脰zge Sa臒lam ; Joachim Reichert ; Alissa Wiengarten ; Knud Seufert ; Saranyan Vijayaraghavan ; David 脡cija ; Willi Auw盲rter ; Francesco Allegretti ; Robert G. Acres ; Kevin C. Prince ; Katharina Diller ; Florian Klappenberger ; Johannes V. Barth
- 刊名：ACS Nano
- 出版年：2013
- 出版时间：May 28, 2013
- 年：2013
- 卷：7
- 期：5
- 页码：4520-4526
- 全文大小：445K
- 年卷期：v.7,no.5(May 28, 2013)
- ISSN：1936-086X
文摘
The fabrication and control of coordination compounds or architectures at well-defined interfaces is a thriving research domain with promise for various research areas, including single-site catalysis, molecular magnetism, light-harvesting, and molecular rotors and machines. To date, such systems have been realized either by grafting or depositing prefabricated metal鈥搊rganic complexes or by protocols combining molecular linkers and single metal atoms at the interface. Here we report a different pathway employing metal鈥搊rganic chemical vapor deposition, as exemplified by the reaction of meso-tetraphenylporphyrin derivatives on atomistically clean Ag(111) with a metal carbonyl precursor (Ru3(CO)12) under vacuum conditions. Scanning tunneling microscopy and X-ray spectroscopy reveal the formation of a meso-tetraphenylporphyrin cyclodehydrogenation product that readily undergoes metalation after exposure to the Ru-carbonyl precursor vapor and thermal treatment. The self-terminating porphyrin metalation protocol proceeds without additional surface-bound byproducts, yielding a single and thermally robust layer of Ru metalloporphyrins. The introduced fabrication scheme presents a new approach toward the realization of complex metal鈥搊rganic interfaces incorporating metal centers in unique coordination environments.