Direct Chemical Vapor Deposition of Graphene on Dielectric Surfaces

详细信息    查看全文

• 作者：Ariel Ismach ; Clara Druzgalski ; Samuel Penwell ; Adam Schwartzberg ; Maxwell Zheng ; Ali Javey ; Jeffrey Bokor ; Yuegang Zhang
• 刊名：Nano Letters
• 出版年：2010
• 出版时间：May 12, 2010
• 年：2010
• 卷：10
• 期：5
• 页码：1542-1548
• 全文大小：533K
• 年卷期：v.10,no.5(May 12, 2010)
• ISSN：1530-6992

文摘

Direct deposition of graphene on various dielectric substrates is demonstrated using a single-step chemical vapor deposition process. Single-layer graphene is formed through surface catalytic decomposition of hydrocarbon precursors on thin copper films predeposited on dielectric substrates. The copper films dewet and evaporate during or immediately after graphene growth, resulting in graphene deposition directly on the bare dielectric substrates. Scanning Raman mapping and spectroscopy, scanning electron microscopy, and atomic force microscopy confirm the presence of continuous graphene layers on tens of micrometer square metal-free areas. The revealed growth mechanism opens new opportunities for deposition of higher quality graphene films on dielectric materials.