Radio Frequency Sputter Deposition of Epitaxial Nanocrystalline Nd1-xSrxCoO3 Thin Films

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• 作者：Lorenzo Malavasi ; Eliana Quartarone ; Carla Sanna ; Nathascia Lampis ; Alessandra Geddo Lehmann ; Cristina Tealdi ; Maria Cristina Mozzati ; Giorgio Flor
• 刊名：Chemistry of Materials
• 出版年：2006
• 出版时间：October 31, 2006
• 年：2006
• 卷：18
• 期：22
• 页码：5230 - 5237
• 全文大小：432K
• 年卷期：v.18,no.22(October 31, 2006)
• ISSN：1520-5002

文摘

In this paper we report the deposition of epitaxial thin films of Nd_1-xSr_xCoO₃ with x = 0, 0.2, and 0.5on single-crystalline substrates (SrTiO₃ and LaAlO₃) carried out by means of rf-magnetron sputtering.The deposited films are all completely oriented and epitaxial and characterized by a nanocrystallinemorphology. As-deposited films have an average roughness around 1 nm while after the thermal treatmentthis increases up to 20 nm while preserving the nanocrystalline morphology. All the films deposited onSrTiO₃ have shown to be under a certain degree of tensile strain while those on the LaAlO₃ experiencea compressive strain, thus suggesting that at about 50 nm the films are not fully relaxed, even after thethermal treatment. For the x = 0.2 composition three different thicknesses have been investigated, revealingan increased strain for the thinner films.