Close-Packed Noncircular Nanodevice Pattern Generation by Self-Limiting Ion-Mill Process

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• 作者：Vishal A. Parekh ; Ariel Ruiz ; Paul Ruchhoeft ; Stanko Brankovic ; Dmitri Litvinov
• 刊名：Nano Letters
• 出版年：2007
• 出版时间：October 2007
• 年：2007
• 卷：7
• 期：10
• 页码：3246 - 3248
• 全文大小：241K
• 年卷期：v.7,no.10(October 2007)
• ISSN：1530-6992

文摘

We describe a self-limiting, low-energy argon-ion-milling process that enables noncircular device patterns, such as squares or hexagons, tobe formed using precursor arrays of uniform circular openings in poly(methyl methacrylate) defined using electron beam lithography. Theproposed patterning technique is of particular interest for bit-patterned magnetic recording medium fabrication, where square magnetic bitsresult in improved recording system performance. Bit-patterned magnetic medium is among the primary candidates for the next generationmagnetic recording technologies and is expected to extend the areal bit density limits far beyond 1 Tbit/in². The proposed patterning technologycan be applied either for direct medium prototyping or for manufacturing of nanoimprint lithography templates or ion beam lithography stencilmasks that can be utilized in mass production.