Silica Nanostructures Templated by Oriented Block Copolymer Thin Films Using Pore-Filling and Selective-Mineralization Routes

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• 作者：Brian J. Melde ; Sandra L. Burkett ; Ting Xu ; James T. Goldbach ; Thomas P. Russell ; and Craig J. Hawker
• 刊名：Chemistry of Materials
• 出版年：2005
• 出版时间：September 6, 2005
• 年：2005
• 卷：17
• 期：18
• 页码：4743 - 4749
• 全文大小：705K
• 年卷期：v.17,no.18(September 6, 2005)
• ISSN：1520-5002

文摘

Poly(styrene-block-methyl methacrylate) thin films with cylindrical microdomains oriented normal tothe surface were used as templates for nanoscopic silica structures. Silicon oxide was synthesized usingvapor-phase and liquid-phase sol-gel reactions of tetraethoxysilane (TEOS). The vapor-phase reactionselectively formed silicon oxide within the poly(methyl methacrylate) (PMMA) domains. The use ofliquid sols led to reconstruction of the film by selective solvation of the PMMA chains, followed bymineralization of silicon oxide. In addition, the vapor-phase and liquid-phase reactions were used todeposit silica in porous polystyrene (PS) films made by selective etching of the PMMA cylinders. Removalof polymer by calcination in air at 500 C resulted in ordered arrays of silica nanostructures. Dynamicwettability measurements were made on nanostructured surfaces after functionalization with hydrophobicorganosilanes.