Stimulated Emission Depletion Lithography with Mercapto-Functional Polymers
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- 作者：Bianca Buchegger ; Johannes Kreutzer ; Birgit Plochberger ; Richard Wollhofen ; Dmitry Sivun ; Jaroslaw Jacak ; Gerhard J. Schütz ; Ulrich Schubert ; Thomas A. Klar
- 刊名：ACS Nano
- 出版年：2016
- 出版时间：February 23, 2016
- 年：2016
- 卷：10
- 期：2
- 页码：1954-1959
- 全文大小：289K
- ISSN：1936-086X
文摘
Surface reactive nanostructures were fabricated using stimulated emission depletion (STED) lithography. The functionalization of the nanostructures was realized by copolymerization of a bifunctional metal oxo cluster in the presence of a triacrylate monomer. Ligands of the cluster surface cross-link to the monomer during the lithographic process, whereas unreacted mercapto functionalized ligands are transferred to the polymer and remain reactive after polymer formation of the surface of the nanostructure. The depletion efficiency in dependence of the cluster loading was investigated and full depletion of the STED effect was observed with a cluster loading exceeding 4 wt %. A feature size by λ/11 was achieved by using a donut-shaped depletion beam. The reactivity of the mercapto groups on the surface of the nanostructure was tested by incubation with mercapto-reactive fluorophores.