Transfer of Chemically Modified Graphene with Retention of Functionality for Surface Engineering

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• 作者：Keith E. Whitener Jr. ; Woo-Kyung Lee ; Nabil D. Bassim ; Rhonda M. Stroud ; Jeremy T. Robinson ; Paul E. Sheehan
• 刊名：Nano Letters
• 出版年：2016
• 出版时间：February 10, 2016
• 年：2016
• 卷：16
• 期：2
• 页码：1455-1461
• 全文大小：418K
• ISSN：1530-6992

文摘

Single-layer graphene chemically reduced by the Birch process delaminates from a Si/SiO_x substrate when exposed to an ethanol/water mixture, enabling transfer of chemically functionalized graphene to arbitrary substrates such as metals, dielectrics, and polymers. Unlike in previous reports, the graphene retains hydrogen, methyl, and aryl functional groups during the transfer process. This enables one to functionalize the receiving substrate with the properties of the chemically modified graphene (CMG). For instance, magnetic force microscopy shows that the previously reported magnetic properties of partially hydrogenated graphene remain after transfer. We also transfer hydrogenated graphene from its copper growth substrate to a Si/SiO_x wafer and thermally dehydrogenate it to demonstrate a polymer- and etchant-free graphene transfer for potential use in transmission electron microscopy. Finally, we show that the Birch reduction facilitates delamination of CMG by weakening van der Waals forces between graphene and its substrate.