Sub-10 nm Nanoimprint Lithography by Wafer Bowing
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- 作者：Wei Wu ; William M. Tong ; Jonathan Bartman ; Yufeng Chen ; Robert Walmsley ; Zhaoning Yu ; Qiangfei Xia ; Inkyu Park ; Carl Picciotto ; Jun Gao ; Shih-Yuan Wang ; Deborah Morecroft ; Joel Yang ; Karl K. Berggren
- 刊名：Nano Letters
- 出版年：2008
- 出版时间：November 12, 2008
- 年：2008
- 卷：8
- 期：11
- 页码：3865-3869
- 全文大小：299K
- 年卷期：v.8,no.11(November 12, 2008)
- ISSN：1530-6992
文摘
We introduce the concept of wafer bowing to affect nanoimprinting. This approach allows a design that can fit the key imprinting mechanism into a compact module, which we have constructed and demonstrated with an overlay and resolution of <0.5 μm and <10 nm, respectively. In the short term, this wafer bowing approach makes nanoimprint lithography much more accessible to a broad range of researchers. More importantly, this approach eliminates machine movement other than wafer bowing and shortens the mechanical path; these will enable the achievement of excellent patterning and overlay at a much lower cost. In the long term, wafer bowing is extensible to step-and-repeat printing for volume manufacturing.