Determination of the Absolute Thickness of Ultrathin Al2O3 Overlayers on Si (100) Substrate

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• 作者：Kyung Joong Kim ; Jong Shik Jang ; Joo-Hee Lee ; Yun-Jung Jee ; Chung-Sam Jun
• 刊名：Analytical Chemistry
• 出版年：2009
• 出版时间：October 15, 2009
• 年：2009
• 卷：81
• 期：20
• 页码：8519-8522
• 全文大小：235K
• 年卷期：v.81,no.20(October 15, 2009)
• ISSN：1520-6882

文摘

The thickness of nanometer Al₂O₃ films was studied by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). The thickness was determined from mutual calibration of the XPS and TEM measurements. The thickness offset of Al₂O₃ films was proved to be close to zero by in situ XPS analysis. The thicknesses of a series of Al₂O₃/Si (100) films with different Al₂O₃ thicknesses could be determined by mutual calibration from the thicknesses measured by TEM and XPS. The electron attenuation length of the Al 2p electron was determined as 2.4334 nm in the Al₂O₃ matrix.