Adsorption and Decomposition of Monoethanolamine on Cu(100)

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• 作者：Yi-Shiue Lin ; Jain-Shiun Lin ; Ching-Yung Wang ; Che-Wei Kuo ; Jong-Liang Lin*
• 刊名：Journal of Physical Chemistry C
• 出版年：2009
• 出版时间：March 12, 2009
• 年：2009
• 卷：113
• 期：10
• 页码：4147-4154
• 全文大小：234K
• 年卷期：v.113,no.10(March 12, 2009)
• ISSN：1932-7455

文摘

Temperature-programmed reaction/desorption and reflection−absorption infrared spectroscopy have been employed to investigate the adsorption and decomposition of HOCH₂CH₂NH₂ on Cu(100). HOCH₂CH₂NH₂ molecules desorb from the multilayer and monolayer with a maximum rate at 203 and 255 K, respectively. The desorption state at 255 K corresponds to an adsorption energy of 66.0 kJ·mol⁻¹ calculated for a first-order kinetics with a preexponential factor of 10¹³ s⁻¹. RAIRS suggests that the multilayer and monolayer may be composed of different HOCH₂CH₂NH₂ rotational isomers. HOCH₂CH₂NH₂ can also decompose on Cu(100), approximately at the same temperature range of monolayer desorption, mainly to evolve H₂ and H₂O at 400 K. An Ar⁺-sputtered Cu(100) surface is found to promote the dissociation of HOCH₂CH₂NH₂. Temperature-dependent RAIRS, with the assistance of theoretical calculations based on density-functional theory, strongly suggests that HOCH₂CH₂NH₂ on Cu(100) dissociates first by losing a hydrogen atom to form −OCH₂CH₂NH₂, followed by transformation into HOCH₂CH₂N. Decomposition of the latter species is responsible for the desorption of H₂ and H₂O.