Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists with Varying Photoacid Size

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• 作者：Bryan D. Vogt ; Shuhui Kang ; Vivek M. Prabhu ; Eric K. Lin ; Sushil K. Satija ; Karen Turnquest ; Wen-li Wu
• 刊名：Macromolecules
• 出版年：2006
• 出版时间：November 28, 2006
• 年：2006
• 卷：39
• 期：24
• 页码：8311 - 8317
• 全文大小：171K
• 年卷期：v.39,no.24(November 28, 2006)
• ISSN：1520-5835

文摘

Neutron reflectivity and Fourier transform infrared spectroscopy measurements are used to profilethe deprotection reaction-diffusion front with nanometer resolution in a model photoresist polymer using threeperfluoroalkane-based photoacid generators (PAG) with varying chain lengths. As expected, the spatial extent ofthe deprotection reaction front increases with decreasing PAG size. Although the total extent of deprotectionincreases with increasing postexposure bake time for each PAG, the reaction-diffusion of deprotection does notpropagate continuously into the photoresist polymer. The form of the deprotection reaction front changes becausethe diffusion process is affected by the changing polymer composition. The data are well described by a reaction-diffusion model that includes a simple acid-trapping term and does not require a varying PAG diffusivity. Thishigh-resolution profiling, together with modeling, illustrates details of the coupled diffusion and deprotectionreaction processes that affect lithographic performance.