Toward Plasmonic Solar Cells: Protection of Silver Nanoparticles via Atomic Layer Deposition of TiO2

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• 作者：Stacey D. Standridge ; George C. Schatz ; Joseph T. Hupp*
• 刊名：Langmuir
• 出版年：2009
• 出版时间：March 3, 2009
• 年：2009
• 卷：25
• 期：5
• 页码：2596-2600
• 全文大小：226K
• 年卷期：v.25,no.5(March 3, 2009)
• ISSN：1520-5827

文摘

Plasmonic silver nanoparticles have unique properties that lend themselves to unusual optical applications, potentially including use as absorption amplifiers in dye-sensitized solar cells (DSSCs). However, these particles are easily damaged under oxidizing conditions. Atomic layer deposition of TiO₂ onto transparent-conductive-oxide-supported silver particles was examined as a means of protecting particles while simultaneously incorporating them into DSSC-functional photoelectrodes. The resulting assemblies were exposed to corrosive I⁻/I₃⁻ solutions, and the degree of silver etching was determined via scanning electron microscopy and ultraviolet−visible spectroscopy. To form a pinhole-free (i.e., fully protective) crystalline TiO₂ layer, 7.7 nm (300 cycles) must be deposited. If, however, a 0.2 nm (2 cycles) Al₂O₃ adhesion layer is included, only 5.8 nm (211 cycles) of TiO₂ are necessary for the formation of a pinhole-free coating.