Atomic Layer Deposition of Conformal Inorganic Nanoscale Coatings on Three-Dimensional Natural Fiber Systems: Effect of Surface Topology on Film Growth Characteristics

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• 作者：G. Kevin Hyde ; Kie Jin Park ; S. Michael Stewart ; Juan P. Hinestroza ; Gregory N. Parsons
• 刊名：Langmuir
• 出版年：2007
• 出版时间：September 11, 2007
• 年：2007
• 卷：23
• 期：19
• 页码：9844 - 9849
• 全文大小：327K
• 年卷期：v.23,no.19(September 11, 2007)
• ISSN：1520-5827

文摘

Atomic-scale material deposition is utilized to achieve uniform coverage and modification of the surface propertiesof natural fiber and woven fabric materials, where irregular nanoscale features are embedded in a macroscaleinterpenetrating fiber network. The complex surface topology of the woven fabric results in significantly differentfilm-growth thickness per ALD cycle as compared to planar surfaces coated using the same process conditions, likelydue to reactant adsorption within the fiber starting material, as well as impeded reactant transport out of the fabricsystem during the purge cycle. Cotton textiles modified with conformal nanoscale Al₂O₃ are found to show extremehydrophobic effects, distinctly different from planar surfaces that receive the same coatings. The results highlight keyconcerns for achieving controlled conformal coatings on complex surfaces and open the possibility for new textilefinishing approaches to create novel fabric-based materials with specialized function and performance.