Detection of C-Si Covalent Bond in CH3 Adsorbate Formed by Chemical Reaction of CH3MgBr and H:Si(111)

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• 作者：Taro Yamada ; Tomoyuki Inoue ; Keiko Yamada ; Nao Takano ; Tetsuya Osaka ; Hiroshi Harada ; Katsuhiko Nishiyama ; and Isao Taniguchi
• 刊名：Journal of the American Chemical Society
• 出版年：2003
• 出版时间：July 2, 2003
• 年：2003
• 卷：125
• 期：26
• 页码：8039 - 8042
• 全文大小：74K
• 年卷期：v.125,no.26(July 2, 2003)
• ISSN：1520-5126

文摘

High-resolution electron energy loss spectroscopy (HREELS) yielded evidence for the formationof single covalent bonds between Si(111) surface atoms and CH₃ groups from the reaction of CH₃MgBrand hydrogen-terminated H:Si(111)(1 × 1). The vibration at 678 cm^-1, assigned to the C-Si bond, wasisolated within the spectrum of CH₃ on deuterium-terminated D:Si(111)(1 × 1). The CH₃ groups werethermally stable at temperatures below 600 K. The C-Si bonds are essential for enhancing the usefulnessof alkyl moieties, which will lead to a new prospective technology of nanoscale fabrication and biochemicalapplication.