Applications of Photocurable PMMS Thiol−Ene Stamps in Soft Lithography
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- 作者：Luis M. Campos ; Tu T. Truong ; Dong Eun Shim ; Michael D. Dimitriou ; Daniel Shir ; Ines Meinel ; Jeffrey A. Gerbec ; H. Thomas Hahn ; John A. Rogers ; Craig J. Hawker
- 刊名：Chemistry of Materials
- 出版年：2009
- 出版时间：November 10, 2009
- 年：2009
- 卷：21
- 期：21
- 页码：5319-5326
- 全文大小：979K
- 年卷期：v.21,no.21(November 10, 2009)
- ISSN：1520-5002
文摘
We report the performance and characterization of a material based on poly[(3-mercaptopropyl)methylsiloxane] (PMMS) in various soft lithography applications. PMMS stamps were made by cross-linking with triallyl cyanurate and ethoxylated (4) bisphenol A dimethacrylate via thiol−ene mixed-mode chemistry. The surface chemistry of the materials was characterized by XPS when varied from hydrophilic through oxygen plasma treatment, to hydrophobic by exposure to a fluorinated trichlorosilane agent. The materials are transparent above 300 nm and thermally stable up to 225 °C, thus rendering them capable to be employed in step-and-flash imprint lithography, nanoimprint lithography, nanotransfer printing, and proximity-field nanopatterning. The successful pattern replication from the micrometer to sub-100 nm scale was demonstrated.