In Situ Reaction Mechanism Studies on Lithium Hexadimethyldisilazide and Ozone Atomic Layer Deposition Process for Lithium Silicate

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• 作者：Yoann Tomczak ; Kjell Knapas ; Markku Sundberg ; Markku Leskel盲 ; Mikko Ritala
• 刊名：The Journal of Physical Chemistry C
• 出版年：2013
• 出版时间：July 11, 2013
• 年：2013
• 卷：117
• 期：27
• 页码：14241-14246
• 全文大小：298K
• 年卷期：v.117,no.27(July 11, 2013)
• ISSN：1932-7455

文摘

Reaction mechanisms in the LiN[Si(CH₃)₃]₂鈥揙₃ atomic layer deposition (ALD) process for lithium silicate were investigated in situ with a quartz crystal microbalance (QCM) and a quadrupole mass spectrometer (QMS) at several temperatures. In addition, ex situ Fourier transform infrared (FT-IR) measurements were carried out to identify the bonds present in the films. QMS indicates typical combustion byproducts such as CO₂ (m/z = 44), CO (m/z = 28), H₂O (m/z = 18) and NO (m/z = 30) during the ozone pulse. Signals corresponding to the fragments of the ligands are present, but their low intensities imply that there are no direct ligand exchange reactions with the hydroxyl groups on the surface. QCM results confirm the decomposition of the ligand through complex reactions upon reaching the surface. Accordingly, several reaction pathways were drawn, and DFT calculations were performed to assess the reactivity of each reaction intermediate. The influence of the deposition temperature on several characteristics of the process such as composition of the film and growth per cycle was also explained.