Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates

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• 作者：Zhiyong Li ; William M. Tong ; William F. Stickle ; David L. Neiman ; R. Stanley Williams ; Luke L. Hunter ; A. Alec Talin ; D. Li ; S. R. J. Brueck
• 刊名：Langmuir
• 出版年：2007
• 出版时间：April 24, 2007
• 年：2007
• 卷：23
• 期：9
• 页码：5135 - 5138
• 全文大小：250K
• 年卷期：v.23,no.9(April 24, 2007)
• ISSN：1520-5827

文摘

We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS)applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substratewith imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patternedstructures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20-60 nm) and redeposited Agnanodots (~10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor(10¹⁰) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricatedwith the same method did not undergo such a morphological change after the plasma treatment and showed noenhancement of Raman scattering.