A Highly Efficient Silole-Containing Dithienylethene with Excellent Thermal Stability and Fatigue Resistance: A Promising Candidate for Optical Memory Storage Materials
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- 作者：Jacky Chi-Hung Chan ; Wai Han Lam ; Vivian Wing-Wah Yam
- 刊名：Journal of the American Chemical Society
- 出版年：2014
- 出版时间：December 10, 2014
- 年：2014
- 卷：136
- 期：49
- 页码：16994-16997
- 全文大小：311K
- ISSN：1520-5126
文摘
Diarylethene compounds are potential candidates for applications in optical memory storage systems and photoswitchable molecular devices; however, they usually show low photocycloreversion quantum yields, which result in ineffective erasure processes. Here, we present the first highly efficient photochromic silole-containing dithienylethene with excellent thermal stability and fatigue resistance. The photochemical quantum yields for photocyclization and photocycloreversion of the compound are found to be high and comparable to each other; the latter of which is rarely found in diarylethene compounds. These would give rise to highly efficient photoswitchable material with effective writing and erasure processes. Incorporation of the silole moiety as a photochromic dithienylethene backbone also was demonstrated to enhance the thermal stability of the closed form, in which the thermal backward reaction to the open form was found to be negligible even at 100 掳C, which leads to a promising candidate for use as photoswitchable materials and optical memory storage.