Grid Pattern of Nanothick Microgel Network
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文摘
A novel grid pattern of two kinds of nanothick microgels was developed by alternate patterning using photolithography.At first, 100-m-wide nanothick PAAm microgel stripes were grafted on a polystyrene surface by UV irradiation ofthe photoreactive azidobenzoyl-derivatized polyallylamine-coated surface through a photomask with 100-m-widestripes. Then, a second set of 100-m-wide nanothick PAAc microgel stripes were grafted across the PAAm-gratedpolystyrene surface by UV irradiation of the photoreactive azidophenyl-derivatized poly(acrylic acid)-coated surfacethrough a photomask placed perpendicularly to the first set of PAAm microgel stripes. The PAAc microgel stripepattern was formed over the PAAm microgel stripe pattern. The cross angle of the two microgel stripes could becontrolled by adjusting the position of the photomask when the second microgel pattern was prepared. Swelling andshrinking of the microgels were investigated by scanning probe microscopy (SPM) in an aqueous solution. SPMobservation indicated that the thickness of the gel network was 100 to 500 nm. The regions containing PAAm, PAAc,and the PAAc-PAAm overlapping microgels showed different swelling and shrinking properties when the pH waschanged. The PAAm microgel swelled at low pH and shrank at high pH whereas the PAAc microgel swelled at highpH and shrank at low pH. However, the PAAc-PAAm overlapping microgel did not change as significantly as didthe two microgels, indicating that the swelling and shrinking of the two gels was partially offset. The pH-inducedstructural change was repeatedly reversible. The novel grid pattern of nanothick microgels will find applications invarious fields such as smart actuators, artificial muscles, sensors, and drug delivery systems as well as in tissueengineering and so forth.

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