文摘
In this work, high-quality VO<sub>2sub> epitaxial films were prepared on high-conductivity n-GaN (0001) crystal substrates via an oxide molecular beam epitaxy method. By fabricating a two-terminal VO<sub>2sub>/GaN film device, we observed that the infrared transmittance and resistance of VO<sub>2sub> films could be dynamically controlled by an external bias voltage. Based on the hysteretic switching effect of VO<sub>2sub> in infrared range, an optoelectronic memory device was achieved. This memory device was operated under the “electrical writing–optical reading” mode, which shows promising applications in VO<sub>2sub>-based optoelectronic device in the future.