Impact of Nanosize on Supercapacitance: Study of 1D Nanorods and 2D Thin-Films of Nickel Oxide

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• 作者：Ranjit A. Patil ; Cheng-Ping Chang ; Rupesh S. Devan ; Yung Liou ; Yuan-Ron Ma
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2016
• 出版时间：April 20, 2016
• 年：2016
• 卷：8
• 期：15
• 页码：9872-9880
• 全文大小：565K
• 年卷期：0
• ISSN：1944-8252

文摘

We synthesized unique one-dimensional (1D) nanorods and two-dimensional (2D) thin-films of NiO on indium–tin-oxide thin-films using a hot-filament metal-oxide vapor deposition technique. The 1D nanorods have an average width and length of ∼100 and ∼500 nm, respectively, and the densely packed 2D thin-films have an average thickness of ∼500 nm. The 1D nanorods perform as parallel units for charge storing. However, the 2D thin-films act as one single unit for charge storing. The 2D thin-films possess a high specific capacitance of ∼746 F/g compared to 1D nanorods (∼230 F/g) using galvanostatic charge–discharge measurements at a current density of 3 A/g. Because the 1D NiO nanorods provide more plentiful surface areas than those of the 2D thin-films, they are fully active at the first few cycles. However, the capacitance retention of the 1D nanorods decays faster than that of the 2D thin-films. Also, the 1D NiO nanorods suffer from instability due to the fast electrochemical dissolution and high nanocontact resistance. Electrochemical impedance spectroscopy verifies that the low dimensionality of the 1D NiO nanorods induces the unavoidable effects that lead them to have poor supercapacitive performances. On the other hand, the slow electrochemical dissolution and small contact resistance in the 2D NiO thin-films favor to achieve high specific capacitance and great stability.