High-Efficiency Stepwise Contraction and Adsorption Nanolithography
详细信息 查看全文
- 作者：Li Tan ; Zhenqian Ouyang ; Maozi Liu ; John Ell ; Jun Hu ; Timothy E. Patten ; Gang-yu Liu
- 刊名：Journal of Physical Chemistry B
- 出版年：2006
- 出版时间：November 23, 2006
- 年：2006
- 卷：110
- 期：46
- 页码：23315 - 23320
- 全文大小：294K
- 年卷期：v.110,no.46(November 23, 2006)
- ISSN：1520-5207
文摘
A new miniaturization protocol is demonstrated using stretching and relaxation of an elastomer substrate. Adesigned microstructure is formed on the stretched substrate and subsequently becomes miniaturized whenthe substrate relaxes. More importantly, the miniaturized structures can be transferred onto a new substratefor further miniaturization or can be utilized as stamps for nanolithography of designated materials. As anexample of this approach, an elastic mold was first cast from a Si mold containing periodic line arrays of1.5-
m line width. Upon relaxation, line width is reduced to 240 nm. The new elastomer may be used asstamps for micro- and nanofabrication of materials such as proteins. The polymer surface roughness or wrinklingbehavior at nanoscale is found to follow classic stability model in solid mechanics. This observation providesmeans to design and control the surface roughness to meet specific requirements.
m line width. Upon relaxation, line width is reduced to 240 nm. The new elastomer may be used asstamps for micro- and nanofabrication of materials such as proteins. The polymer surface roughness or wrinklingbehavior at nanoscale is found to follow classic stability model in solid mechanics. This observation providesmeans to design and control the surface roughness to meet specific requirements.