文摘
In this paper, we report our recent work on preparing two-dimensional patterned microstructure arrays usingthree-dimensional colloidal crystals as templates, namely, colloidal crystal-assisted lithography. Two alternative processesare described and involved in colloidal crystal-assisted lithography. One is based upon imprinting the polymer filmswith three-dimensional silica colloidal crystals, and the other is based upon chemically depositing Ag microstructureson Au substrates covered by polymer colloidal crystals. By varying the experimental conditions in the colloidalcrystal-assisted lithography process, we can intentionally control the morphologies of the resulting microstructures.The resultant Ag-coated Au substrates can be used as surface-enhanced Raman scattering substrates, and they wouldprovide an ideal system for the mechanism study of surface-enhanced Raman scattering. We expect that colloidalcrystal-assisted lithography will be a versatile approach which can be applied to patterning other materials such asfunctional molecules, polymers, oxides, and metals.