Synthesis of Partially Protected Block Copolymers Based on 4-Hydroxystyrene Using NMRP and a Sequence of Polymer Analogous Reactions
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- 作者：M. Messerschmidt ; M. Millaruelo ; H. Komber ; L. Hä ; ussler ; B. Voit ; T. Krause ; M. Yin ; W.-D. Habicher
- 刊名：Macromolecules
- 出版年：2008
- 出版时间：April 22, 2008
- 年：2008
- 卷：41
- 期：8
- 页码：2821 - 2831
- 全文大小：238K
- 年卷期：v.41,no.8(April 22, 2008)
- ISSN：1520-5835
文摘
We present the synthesis and characterization of a family of partially protected block copolymers and their precursors synthesized by means of nitroxide mediated radical polymerization (NMRP) and a sequence of quantitative and orthogonal polymer analogous reactions. The target materials consist of an unprotected 4-hydroxystyrene block and a tert-butoxycarbonyl (BOC) or a tert-butyl (TBU) protected block. Corresponding precursor block copolymers exhibit low polydispersity indexes (PDI) (<1.36) and show well-defined compositions of their blocks. Techniques like NMR, FT-IR, GPC, DSC, and TGA were applied in order to verify structure, compositions, molar masses, molecular weight distributions, and thermal properties. These materials are promising candidates for self-assembly in thin films and subsequent photolithographic patterning applications.