Facile Size-Tunable Fabrication of Functional Tin Dioxide Nanostructures by Multiple Size Reduction Lithography

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• 作者：Hyeong-Ho Park ; Wai Lung Law ; Xin Zhang ; Seon-Yong Hwang ; Sang Hyun Jung ; Hyun-Beom Shin ; Ho Kwan Kang ; Hyung-Ho Park ; Ross H. Hill ; Chul Ki Ko
• 刊名：ACS Applied Materials & Interfaces
• 出版年：2012
• 出版时间：May 23, 2012
• 年：2012
• 卷：4
• 期：5
• 页码：2507-2514
• 全文大小：491K
• 年卷期：v.4,no.5(May 23, 2012)
• ISSN：1944-8252

文摘

A novel ultraviolet (UV)-assisted imprinting procedure that employs photosensitive tin(II) 2-ethylhexanoate is presented for the facile size-tunable fabrication of functional tin dioxide (SnO₂) nanostructures by varying annealing temperatures. These imprinted SnO₂ nanostructures were also used as new masters for size reduction lithography. SnO₂ lines down to 40 nm wide were obtained from a silicon master with 200 nm wide lines by simply performing size reduction lithography twice. This leads to 80 and 87.5% reduction in the width and height of imprinted lines, respectively. An imprinted pattern annealed at 400 掳C demonstrated transmittance greater than 90% over the range of 350鈥?00 nm, which is high enough to make the pattern useful as a transparent SnO₂ mold. This demonstrated approach allows the accessibility to size-tunable molds, eliminating the need for conventional expensive imprinting masters with very fine structures, as well as functional SnO₂ nanostructures, potentially useful in applications where ordered surface nanostructures are required, such as photonic crystals, biological sensors, and model catalysts.

Keywords:

tin dioxide; photochemical mechanism; nanoimprint lithography; size reduction lithography