Toward the Controlled Synthesis of Hexagonal Boron Nitride Films
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- 作者：Ariel Ismach ; Harry Chou ; Domingo A. Ferrer ; Yaping Wu ; Stephen McDonnell ; Herman C. Floresca ; Alan Covacevich ; Cody Pope ; Richard Piner ; Moon J. Kim ; Robert M. Wallace ; Luigi Colombo ; Rodney S. Ruoff
- 刊名：ACS Nano
- 出版年：2012
- 出版时间：July 24, 2012
- 年：2012
- 卷：6
- 期：7
- 页码：6378-6385
- 全文大小：626K
- 年卷期：v.6,no.7(July 24, 2012)
- ISSN：1936-086X
文摘
Atomically smooth hexagonal boron nitride (h-BN) layers have very useful properties and thus potential applications for protective coatings, deep ultraviolet (DUV) emitters, and as a dielectric for nanoelectronics devices. In this paper, we report on the growth of h-BN by a low-pressure chemical vapor deposition (LPCVD) process using diborane and ammonia as the gas precursors. The use of LPCVD allows synthesis of h-BN with a controlled number of layers defined by the growth conditions, temperature, time, and gas partial pressure. Furthermore, few-layer h-BN was also grown by a sequential growth method, and insights into the growth mechanism are described, thus forming the basis of future growth of h-BN by atomic layer epitaxy.