Nanopatterned Carbon Films with Engineered Morphology by Direct Carbonization of UV-Stabilized Block Copolymer Films

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• 作者：Yong Wang ; Jinquan Liu ; Silke Christiansen ; Dong Ha Kim ; Ulrich Gö ; sele ; Martin Steinhart
• 刊名：Nano Letters
• 出版年：2008
• 出版时间：November 12, 2008
• 年：2008
• 卷：8
• 期：11
• 页码：3993-3997
• 全文大小：310K
• 年卷期：v.8,no.11(November 12, 2008)
• ISSN：1530-6992

文摘

Nanopatterned thin carbon films were prepared by direct and expeditious carbonization of the block copolymer polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) without the necessity of slow heating to the process temperature and of addition of further carbon precursors. Carbonaceous films having an ordered “dots-on-film” surface topology were obtained from reverse micelle monolayers. The regular nanoporous morphology of PS-b-P2VP films obtained by subjecting reverse micelle monolayers to swelling-induced surface reconstruction could likewise be transferred to carbon films thus characterized by ordered nanopit arrays. Stabilization of PS-b-P2VP by UV irradiation and the concurrent carbonization of both blocks were key to the conservation of the film topography. The approach reported here may enable the realization of a broad range of nanoscaled architectures for carbonaceous materials using a block copolymer ideally suited as a template because of the pronounced repulsion between its blocks and its capability to form highly ordered microdomain structures.