文摘
TiO2-based photocatalyst layers are still highly favored materials for photocatalysis on immobilized semiconductor electrodes because of their favorable electronic band positions, high corrosion stability, cost efficiency, and readily available titanium. Since chemical synthesis of nanocrystalline TiO2 layers from alkoxide precursors is usually complex and of low reproducibility, new methods are required to enable large-scale production of immobilized titania catalyst layers for practical applications. The synthesis of TiO2-layers on fluorine doped tin oxide (FTO) by means of a reactive sputtering process is reported here, with stable operation being implied by the means of a 位-sensor. Structural, electrochemical, and photocatalytic properties were investigated for different layer thicknesses and postdeposition annealing temperature of the deposited TiO2 by means of SEM, TEM, XRD, XPS, UV/vis spectroscopy, and a range of photochemical measurements including iE curves, acIS, IMVS and IMPS, and IPCE.