Photolabile Carboxylic Acid Protected Terpolymers for Surface Patterning. Part 2: Photocleavage and Film Patterning

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• 作者：M. Millaruelo ; L. M. Eng ; M. Mertig ; B. Pilch ; U. Oertel ; J. Opitz ; B. Sieczkowska ; F. Simon ; B. Voit
• 刊名：Langmuir
• 出版年：2006
• 出版时间：October 24, 2006
• 年：2006
• 卷：22
• 期：22
• 页码：9446 - 9452
• 全文大小：338K
• 年卷期：v.22,no.22(October 24, 2006)
• ISSN：1520-5827

文摘

The surface properties of films made of p-methoxyphenacyl derivative terpolymers, associated with photocleavageby UV irradiation, and their optical patterning are investigated. The deprotection reaction has been monitored by UVand FTIR spectroscopy, contact angle measurements, and X-ray photoelectron spectroscopy, revealing the photoremovalof the protecting p-methoxyphenacyl group in high yields under mild conditions. Parallel and serial patterning of thefilms has been performed by selective irradiation through optical masks and by laser irradiation via fiber tips of ascanning near-field optical microscope, respectively. By irradiation of photolabile protected functional groups, freecarboxylic groups become exposed to the surface with which fluorescent dyes and proteins can be associated specifically.