Deep Ultraviolet Nonlinear Optical Materials

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• 作者：T. Thao Tran ; Hongwei Yu ; James M. Rondinelli ; Kenneth R. Poeppelmeier ; P. Shiv Halasyamani
• 刊名：Chemistry of Materials
• 出版年：2016
• 出版时间：August 9, 2016
• 年：2016
• 卷：28
• 期：15
• 页码：5238-5258
• 全文大小：1352K
• 年卷期：0
• ISSN：1520-5002

文摘

Deep ultraviolet (absorption edge <200 nm, band gap >6.2 eV) nonlinear optical (NLO) materials are of current interest owing to their technological applications and materials design challenges. Technologically, the materials are used in laser systems, atto-second pulse generation, semiconductor manufacturing, and photolithography. Designing and synthesizing a deep UV NLO material requires crystallographic non-centrosymmetry, a wide UV transparency range, a large second-harmonic generating coefficient (d_ij > 0.39 pm/V), moderate birefringence (Δn ∼ 0.07), chemical stability and resistance to laser damage, and ease in the growth of large high-quality single crystals. This review examines the known deep UV NLO materials with respect to their crystal structure, band gap, SHG efficiency, laser damage threshold, and birefringence. Finally, future directions with respect to new deep UV NLO materials are discussed.