We present X-ray photoelectron spectroscopy (XPS) and X-ray photoelectron diffraction (XPD)investigations of CuO thin films electrochemically deposited on an Au(001) single-crystal surface from asolution containing chiral tartaric acid (TA). The presence of
enantiopure TA in the deposition processresults in a homochiral CuO surface, as revealed by XPD. On the other hand, XPD patterns of films depositedwith
racemic tartaric acid or the "
achiral"
meso-tartaric acid are completely symmetric. A detailed analysisof the experimental data using single scattering cluster calculations reveals that the films grown with
L(+)-TA exhibit a CuO(1
) orientation, whereas growth in the presence of
D(-)-TA results in a CuO(
11) surfaceorientation. A simple bulk-truncated model structure with two terminating oxygen layers reproduces theexperimental XPD data. Deposition with alternating enantiomers of tartaric acid leads to CuO films ofalternating chirality. Enantiospecifity of the chiral CuO surfaces is demonstrated by further deposition ofCuO from a solution containing
racemic tartaric acid. The predeposited homochiral films exhibit selectivitytoward the same enantiomeric deposition pathway.