Photocatalytic Patterning and Modification of Graphene

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• 作者：Liming Zhang ; Shuo Diao ; Yufeng Nie ; Kai Yan ; Nan Liu ; Boya Dai ; Qin Xie ; Alfonso Reina ; Jing Kong ; Zhongfan Liu
• 刊名：Journal of the American Chemical Society
• 出版年：2011
• 出版时间：March 2, 2011
• 年：2011
• 卷：133
• 期：8
• 页码：2706-2713
• 全文大小：1153K
• 年卷期：v.133,no.8(March 2, 2011)
• ISSN：1520-5126

文摘

TiO₂-based photocatalysis has been widely used to decompose various organic pollutants for the purpose of environmental protection. Such a 鈥済reen鈥?photochemical process can ultimately degrade organic compounds into CO₂ and H₂O under ambient conditions. We demonstrate here its extended application on the engineering of single- or few-layer graphene. Using a patterned TiO₂ photomask, we have achieved various photochemical tailorings of graphene, including ribbon cutting, arbitrary patterning on any substrate, layer-by-layer thinning, and localized graphene to graphene oxide conversion. UV鈭抳isible spectroscopic studies indicate that the photogenerated, highly reactive 路OH radicals work as sharp chemical scissors. Being a solution-free, cost-effective, scalable, and easy handling technique, the presented photocatalytic patterning and modification approach allows for the versatile design and fabrication of graphene-based devices and circuits, compatible with current microelectronic technology, as demonstrated by this fabricated all-carbon field effect transistor (FET) array.