The Al nanowire arrays were directly deposited on the Si substrates by a facile electron-beam evaporationtechnique, oblique angle deposition. This process was accomplished by tilting the Si substrates and adjustingthe incident angle of evaporated Al vapor flux from the normal of the substrates at 87
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. X-ray diffraction,scanning electron microscopy, and transmission electron microscopy observations indicate that large-areaand single-crystalline Al nanowire arrays are effectively fabricated. In situ high-temperature X-ray diffractionmeasurements show that Al nanowires have a smaller lattice constant and smaller thermal expansion coefficientcompared with the Al film. The thermal expansion mechanism was discussed in detail. Our field emissionresults show that the Al nanowires might be potential field emitters in the future nanodevices.