文摘
Nanoscale epitaxy or nanoepitaxy for fabricating macroscopically well-aligned nanoscale heterogeneous interfaces on a Si substrate is demonstrated, combining bottom-up and top-down processes efficiently. TiO2 sputtered in vacuum was selectively nucleated on the atomically flat surfaces of individual CeO2 nanocubes prefabricated by self-assembly in solution on the substrate, and anatase-type TiO2 was grown after a heat treatment by solid-phase epitaxy to produce tandem nanocrystals with heterogeneous interfaces. The atomic configurations of the tandem nanocrystals fabricated after sputtering and subsequent annealing were determined using high-resolution scanning transmission electron microscopy to characterize the nanoscale heterogeneous interfaces. Sharp heterogeneous interfaces were observed between the anatase TiO2(001) and the CeO2(001) nanocubes, with the TiO2 [110] directions being parallel to the CeO2 [100] directions. This unique nanoepitaxial growth technique will contribute to the development of devices and catalytic materials incorporating functional tandem nanocrystals with nanoscale heterogeneous interfaces.