Reconstruction-Determined Diffusion of Ag Adatoms on the Si(111)-(7×7) Surface

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• 作者：Sobot&iacute ; k ; P. ; O&scaron ; &tcaron ; &aacute ; dal ; I. ; Koc&aacute ; n ; P. ; Myslive&ccaron ; ek ; J. ; Jarol&iacute ; mek ; T.
• 关键词：surface diffusion ; heteroepitaxy ; silver ; Si(111) ; (7X7) ; Monte Carlo simulation ; scanning tunneling microscope
• 刊名：Czechoslovak Journal of Physics
• 出版年：2003
• 出版时间：2003
• 年：2003
• 卷：53
• 期：1
• 页码：69-74
• 全文大小：228 KB
• 刊物类别：Physics and Astronomy
• 刊物主题：Physics
  Physics
  Nuclear Physics, Heavy Ions and Hadrons
  
• 出版者：Springer Netherlands
• ISSN：1572-9486

文摘

Surface diffusion is one of the basic processes determining morphology of a growing film. In the case of metal heteroepitaxy on Si(111)-(7×7) the diffusion is strongly affected by the presence of surface reconstruction, which introduces additional constraints into the motion of deposited atoms. To determine diffusion parameters we used two different approaches: i) interpretation of experimentally observed morphologies by a coarse-grained kinetic Monte Carlo model, ii) direct observation of adatom movement using UHV STM. The attempt frequency and the barrier to hopping of a single Ag atom between half-unit cells of the reconstruction were estimated in both cases. Obtained values are compared and discussed.