Effects of the annealing heating rate on sputtered aluminum oxide films

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• 作者：Xiufeng Tang 唐秀凤
• 关键词：Key wordsaluminum oxide film ; sputtering ; annealing heating rate ; microstructure
• 刊名：Journal of Wuhan University of Technology-Mater. Sci. Ed.
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：32
• 期：1
• 页码：94-99
• 全文大小：
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Materials Science, general;
• 出版者：Wuhan University of Technology
• ISSN：1993-0437
• 卷排序：32

文摘

Al_xO_y films by DC reactive magnetron sputtering were annealed in air ambient at 500 °C for 1 h with different heating rates of 5, 15, and 25 °C/min.Then heat treatments at 900 °Cwere carried out on these 500 °C-annealed films to simulate the high-temperature application environment. Effects of the annealing heating rate on structure and properties of both 500 °C-annealed and 900 °C-heated films were investigated systematically.It was found that distinct γ-Al₂O₃ crystallization was observed in the 900 °C-heated films only when the annealing heating rates are 15 and 25 °C/min. The 500 °C-annealed film possessed the most compact surface morphology in the case of 25 °C/min. The highest microhardness of both 500 °C-annealed and 900 °C-heated films were obtained when the annealing heating rate was 15 °C/min.