Sputtering preparation and magneto-optical properties of GdTbFeCo thin films

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• 作者：Zhixin Huang (1) zxhuang@phy.ccnu.edu.cn
  Weijun Yu (2)
• 关键词：Key words influence – ; magnetron sputtering parameters – ; GdTbFeCo thin film – ; magneto ; optical property – ; variable control method
• 刊名：Journal of Wuhan University of Technology--Materials Science Edition
• 出版年：2012
• 出版时间：April 2012
• 年：2012
• 卷：27
• 期：2
• 页码：195-198
• 全文大小：243.6 KB
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• 作者单位：1. College of Physical Science and Technology, Cental China Normal University, Wuhan, 430079 China2. School of Science, Changzhou Institute of Technology, Changzhou, 213002 China
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Materials Science
  Chinese Library of Science
  
• 出版者：Wuhan University, co-published with Springer
• ISSN：1993-0437

文摘

Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magnetooptical properties GdTbFeCo thin film were investigated by the variable control method. And the influence mechanism was analyzed in detail. After the sputtering parameters were optimized, it was found that when the distance between target and substrate was 72 mm, the thin film thickness was 120 nm, and the sputtering power, sputtering pressure and sputtering time was 75 W, 0.5 Pa and 613 s, respectively, the coercivity with perpendicular anisotropy could be as high as 6735 Oe, and the squareness ratio of the hysteresis loop was almost equal to 1.