用户名: 密码: 验证码:
Effect of Loading Stress on the Growth of Cn/Sn Intermetallic Compounds at High Temperatures
详细信息    查看全文
  • 作者:Ya-Chi Cheng ; Yu-Ting Wang ; Feng-Chih Hsu ; Fang-Ching Lu…
  • 关键词:Copper–tin intermetallic compound formation ; solder diffusion ; micromechanical test
  • 刊名:Journal of Electronic Materials
  • 出版年:2015
  • 出版时间:January 2015
  • 年:2015
  • 卷:44
  • 期:1
  • 页码:604-611
  • 全文大小:1,375 KB
  • 参考文献:1. K.N. Tu, / Acta Metall. 21, 347 (1973). CrossRef
    2. M. Abtew and G. Selvaduray, / Mater. Sci. Eng. 27, 95 (2000).
    3. E.J. Rymaszewski, R.R. Tummala, and T. Watari, / Microelectronic Packaging Handbook, Part I, 2nd ed. (New York: Chapman and Hall, 1997).
    4. C.A. Harper, / Electronic Packaging and Interconnection Handbook (New York: McGraw-Hill, 2005).
    5. D. Lu and C.P. Wong, / Materials for Advanced Packaging (Berlin: Springer, 2009). CrossRef
    6. K.-N. Tu, / Solder Joint Technology (Berlin: Springer, 2007).
    7. J. G?rlich, G. Schmitz, and K.N. Tu, / J. Appl. Phys. Lett. 86, 053106-1 (2005). CrossRef
    8. J.Y. Snog, J. Yu, and T.Y. Lee, / Scr. Meterialia 51, 167 (2004). CrossRef
    9. S.L. Ngoh, W. Zhou, and J.H.L. Pang, / J. Electron. Mater. 37, 1843 (2008). CrossRef
    10. M. Mita, M. Kajihara, N. Kurokawa, and K. Sakamoto, / Mater. Sci. Eng. A 403, 269 (2005). CrossRef
    11. W.K. Liao, C.M. Chen, M.T. Lin, and C.H. Wang, / Scr. Meterialia 65, 691 (2011). CrossRef
    12. F.Z. Xuan, S.S. Shao, Z. Wang, and S.T. Tu, / J. Phys. D Appl. Phys. 42, 015401 (2009). CrossRef
    13. K.N. Tu and R.D. Thompson, / Acta Metall. 30, 947 (1982). CrossRef
  • 刊物类别:Chemistry and Materials Science
  • 刊物主题:Chemistry
    Optical and Electronic Materials
    Characterization and Evaluation Materials
    Electronics, Microelectronics and Instrumentation
    Solid State Physics and Spectroscopy
  • 出版者:Springer Boston
  • ISSN:1543-186X
文摘
Fabrication of reliable solder joints is crucial in microelectronics. In this study we tested solder joints under different loads and temperature-controlled conditions to investigate the effect of external stress on the growth of interfacial Cu/Sn intermetallic compounds (IMCs). Test specimens were prepared by electroplating a layer of Sn (25?μm thick) on a copper substrate. Samples were then clamped in a micromechanical testing apparatus integrated within a furnace. Experiments were performed by using load feedback control to ensure a constant load of 25, 50, or 100?MPa at a constant temperature of 200°C for periods of 24, 72, or 120?h. We then compared samples that underwent stress with those that did not to elucidate the effect of stress and aging on the formation of IMCs. Our results indicate that the presence of external stress affects the formation of Cu/Sn IMCs, including the speed of formation and the resulting thickness. Moreover, the micrographic structure of IMCs formed under external stress varied substantially depending on the amount of stress applied.

© 2004-2018 中国地质图书馆版权所有 京ICP备05064691号 京公网安备11010802017129号

地址:北京市海淀区学院路29号 邮编:100083

电话:办公室:(+86 10)66554848;文献借阅、咨询服务、科技查新:66554700