InGaZnO TFT behavioral model for IC design
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  • 作者:Pydi Bahubalindrun ; Vítor Tavares…
  • 关键词:Equivalent circuit approach ; neural models ; Verilog ; A ; a ; IGZO TFT modeling ; a ; IGZO TFT circuits
  • 刊名:Analog Integrated Circuits and Signal Processing
  • 出版年:2016
  • 出版时间:April 2016
  • 年:2016
  • 卷:87
  • 期:1
  • 页码:73-80
  • 全文大小:983 KB
  • 参考文献:1.Bae, M., Kim, Y., Kong, D., Jeong, H. K., Kim, W., Kim, J., et al. (2011). Analytical models for drain current and gate capacitance in amorphous InGaZnO thin-film transistors with effective carrier density. Electron Device Letters, 32(11), 1546–1548.CrossRef
    2.Bahubalindruni, G., Tavares, V. G., Barquinha, P., Duarte, C., Martins, R., Fortunato, E., de Oliveira, P. G. (2012). Basic analog circuits with a-GIZO thin-film transistors: Modeling and simulation. In SMACD.
    3.Bahubalindruni, P. G., Grade Tavares, V., Barquinha, P., Duarte, C., Guedes de Oliveira, P., Martins, R., et al. (2013). Transparent current mirrors with a-GIZO TFTs: Neural modeling, simulation and fabrication. Journal of Display Technology, 9(12), 1001–1006.CrossRef
    4.Barquinha, P., Pereira, L., Goncalves, G., Martins, R., & Fortunato, E. (2008). The effect of deposition conditions and annealing on the performance of high-mobility GIZO TFTs. Electrochemical and Solid-State Letters, 11(9), 248–251.CrossRef
    5.Chou, K.-I., Hsu, H.-H., Cheng, C.-H., Lee, K.-Y., Li, S.-R., & Chin, A. (2013). A low operating voltage IGZO TFT using LaLuO3 gate dielectric. In IEEE international conference of electron devices and solid-state circuits (EDSSC) (pp. 1–2).
    6.Deng, W., Huang, J., Ma, X., & Ning, T. (2014). An explicit surface-potential-based model for amorphous IGZO thin-film transistors including both tail and deep states. Electron Device Letters, 35(1), 78–80.CrossRef
    7.Lee, S., Park, S., Kim, S., Jeon, Y., Jeon, K., Park, J. H., et al. (2010). Extraction of subgap density of states in amorphous InGaZnO thin-film transistors by using multifrequency capacitance-voltage characteristics. Electron Device Letters, 31(3), 231–233.CrossRef
    8.Li, X., Geng, D., Mativenga, M., & Jang, J. (2014). High-speed dual-gate a-igzo tft-based circuits with top-gate offset structure. IEEE Electron Device Letters, 35(4), 461–463.CrossRef
    9.Meyer, J. E. (1971). Mos models and circuit simulation. RCA Review, 32, 42–63.
    10.Nomura, K., Ohta, H., Takagi, A., Kamiya, T., Hirano, M., & Hosono, H. (2004). Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors. Nature, 432(7016), 488–492.CrossRef
    11.Olziersky, A., Barquinha, P., Vila, A., Magana, C., Fortunato, E., Morante, J., et al. (2011). Role of Ga\(_2\) O\(_3\) -In\(_2\) O\(_3\) -ZnO channel composition on the electrical performance of thin-film transistors. Materials Chemistry and Physics, 131(1), 512–518.CrossRef
    12.Perumal, C., Ishida, K., Shabanpour, R., Boroujeni, B. K., Petti, L., Munzenrieder, N. S., et al. (2013). A compact a-IGZO TFT model based on MOSFET SPICE level=3 template for analog/RF circuit designs. Electron Device Letters, 34(11), 1391–1393.CrossRef
    13.Raiteri, D., Torricelli, F., Myny, K., Nag, M., van der Putten, B., Smits, E., Steudel, S., Tempelaars, K., Tripathi, A., Gelinck, G., van Roermund, A., Cantatore, E. (2012) A 6b 10MS/s current-steering DAC manufactured with amorphous Gallium-Indium-Zinc-Oxide TFTs achieving SFDR > 30dB up to 300 kHz. In ISSCC (pp. 314–316).
    14.Tsormpatzoglou, A., Hastas, N. A., Choi, N., Mahmoudabadi, F., Hatalis, M. K., & Dimitriadis, C. A. (2013). Analytical surface-potential-based drain current model for amorphous ingazno thin film transistors. Journal of Applied Physics, 114(18), 184502–1845026.CrossRef
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  • 作者单位:Pydi Bahubalindrun (1)
    Vítor Tavares (2)
    Pedro Barquinha (1)
    Pedro Guedes de Oliveira (2)
    Rodrigo Martins (1)
    Elvira Fortunato (1)

    1. CENIMAT/I3N, Departamento de Ciência dos Materiais, Faculdade de Ciências e Tecnologia, FCT, Universidade Nova de Lisboa and CEMOP-UNINOVA, 2829-516, Caparica, Portugal
    2. INESC TEC and Faculty of Engineering, University of Porto, Campus FEUP, Rua Dr. Roberto Frias, 378, 4200-465, Porto, Portugal
  • 刊物类别:Engineering
  • 刊物主题:Circuits and Systems
    Electronic and Computer Engineering
    Signal,Image and Speech Processing
  • 出版者:Springer Netherlands
  • ISSN:1573-1979
文摘
This paper presents a behavioral model for amorphous indium–gallium–zinc oxide thin-film transistor using artificial neural network (ANN) based equivalent circuit (EC) approach to predict static and dynamic behavior of the device. In addition, TFT parasitic capacitances (CGS and CGD) characterization through measurements is also reported. In the proposed model, an EC is derived from the device structure, in terms of electrical lumped elements. Each electrical element in the EC is modeled with an ANN. Then these ANNs are connected together as per the EC and implemented in Verilog-A. The proposed model performance is validated by comparing the circuit simulation results with the measured response of a simple common-source amplifier, which has shown 12.2 dB gain, 50 μW power consumption and 85 kHz 3-dB frequency with a power supply of 6 V. The same circuit is tested as an inverter and its response is also presented up to 50 kHz, from both simulations and measurements. These results show that the model is capable of capturing both small and large signal behavior of the device to good accuracy, even including the harmonic distortion of the signal (that emphasizes the nonlinear behavior of the parasitic capacitance), making the model suitable for IC design.

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