Growth of large-area, few-layer graphene by femtosecond pulsed laser deposition with double-layer Ni catalyst

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• 作者：Xiangming Dong ; Shibing Liu ; Haiying Song ; Peng Gu
• 刊名：Journal of Materials Science
• 出版年：2017
• 出版时间：February 2017
• 年：2017
• 卷：52
• 期：4
• 页码：2060-2065
• 全文大小：
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Materials Science, general; Characterization and Evaluation of Materials; Polymer Sciences; Continuum Mechanics and Mechanics of Materials; Crystallography and Scattering Methods; Classical Mechanics;
• 出版者：Springer US
• ISSN：1573-4803
• 卷排序：52

文摘

We demonstrated a simple method of fabricating large-area, few-layer graphene that involves performing femtosecond pulsed laser deposition at a relatively low temperature of 500 °C and a high pressure of 10\(^{-5}\) Torr using a double-layer Ni catalyst. The average thickness of the resulting graphene films was less than 3 nm, their average area was more than 1 cm\(^{2}\), and their electrical resistivity was only 0.44 \({\rm m}\Omega .{\rm cm}\). The laser deposition process was also conducted at different laser energies, and it was observed that the quality of the few-layer graphene could be improved using a double-layer catalyst at a higher laser energy. The ejection of C clusters by breaking the C–C bonds of the HOPG through multi-photon ionization can explain the observed graphene formation characteristics. The insights may facilitate the controllable synthesis of large-area, mono-layer graphene and promote the commercialize application of the graphene.