A study of the effect of the structure of plasma-chemical silicon nitride on its masking properties

详细信息    查看全文

• 作者：V. I. Garmash ; V. I. Egorkin ; V. E. Zemlyakov ; A. V. Kovalchuk…
• 关键词：plasma ; enhanced chemical ; vapor deposition ; silicon nitride ; Fourier ; transform IR spectrometry
• 刊名：Semiconductors
• 出版年：2015
• 出版时间：December 2015
• 年：2015
• 卷：49
• 期：13
• 页码：1727-1730
• 全文大小：198 KB
• 参考文献：1.S. A. Zotov, V. V. Kalugin, S. P. Timoshenkov, et al., Prib. Sistemy. Upravl., Kontrol鈥? Diagnost.,No. 5, 35 (2008).
  2.V. A. Baburov, V. E. Zemlyakov, and V. A. Krasnik, Elektron. Tekh. Ser. 1: SVCh-Tekh.,No. 2, 50 (2010).
  3.A. Kovalchuk, G. Beshkov, and S. Shapoval, J. Res. Phys. 31, 37 (2007).
  4.V. V. Popov, D. M. Ermolaev, K. V. Maremyanin, et al., Appl. Phys. Lett. 98, 153504 (2011).ADS CrossRef
  5.A. V. Koval鈥檆huk, S. Yu. Shapoval, S. S. Lebedev, et al., Vestn. NIYaU MIFI 3 (2), 1 (2014).
  
• 作者单位：V. I. Garmash (1)
  V. I. Egorkin (1)
  V. E. Zemlyakov (1)
  A. V. Kovalchuk (2)
  S. Yu. Shapoval (2)
  
  1. National Research University 鈥淢IET鈥? Moscow, Russia
  2. Institute for Problems of Technology of Microelectronics and High-Purity Materials, Russian Academy of Sciences, Chernogolovka, Moscow oblast, Russia
  
• 刊物类别：Physics and Astronomy
• 刊物主题：Physics
  Magnetism and Magnetic Materials
  Electromagnetism, Optics and Lasers
  Russian Library of Science
  
• 出版者：MAIK Nauka/Interperiodica distributed exclusively by Springer Science+Business Media LLC.
• ISSN：1090-6479

文摘

Dependence of the chemical composition of a film of plasma-chemical silicon nitride on the technological parameters of the deposition process is studied. The stages in which the process parameters are optimized in order to improve the masking properties of the film are described. A systematic study of the Fourier-transform infra-red (IR) spectra of plasma-chemical silicon-nitride films is carried out. It is found that the chemical resistance of a silicon-nitride film depends on the configuration in which hydrogen is incorporated into chemical bonds. Keywords plasma-enhanced chemical-vapor deposition silicon nitride Fourier-transform IR spectrometry