Electrophoretic Deposition of Cu-SiO2 Coatings by DC and Pulsed DC for Enhanced Surface-Mechanical Properties

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• 作者：H. S. Maharana ; Suprabha Lakra ; S. Pal…
• 关键词：electrical conductivity ; electrophoretic deposition ; ultrafine SiO2 ; wear
• 刊名：Journal of Materials Engineering and Performance
• 出版年：2016
• 出版时间：January 2016
• 年：2016
• 卷：25
• 期：1
• 页码：327-337
• 全文大小：3,086 KB
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• 作者单位：H. S. Maharana (1)
  Suprabha Lakra (1)
  S. Pal (1)
  A. Basu (1)
  
  1. Department of Metallurgical and Materials Engineering, National Institute of Technology, Rourkela, Odisha, 769008, India
  
• 刊物类别：Chemistry and Materials Science
• 刊物主题：Chemistry
  Characterization and Evaluation Materials
  Materials Science
  Tribology, Corrosion and Coatings
  Quality Control, Reliability, Safety and Risk
  Engineering Design
  
• 出版者：Springer New York
• ISSN：1544-1024

文摘

The present study explored the possibilities of improvement in the surface-mechanical properties of electrodeposited Cu-SiO₂ composite coating and its underlying mechanism. Composite coatings were developed using SiO₂-dispersed acidic copper sulfate electrolyte by direct current and pulse-current electro-codeposition techniques with variation of pulse frequencies at a fixed duty cycle. X-ray diffraction analysis of the coatings revealed information regarding the presence of various phases and crystallographic orientations of the deposited Cu matrix. Scanning electron microscopy and energy dispersive x-ray spectroscopy techniques were used to investigate the surface morphology and chemical composition of the coatings, respectively, and it was observed that SiO₂ particles were uniformly distributed in the composite coatings. Surface roughness was found to be reduced with the increasing pulse frequency. The Vickers microhardness and ball-on-plate wear study showed improvement in surface-mechanical properties due to the formation of fine Cu matrix, dispersion strengthening due to homogeneously distributed SiO₂ particles, and the preferred orientation of the Cu matrix. Marginal decrease in electrical conductivity with the increasing SiO₂ content and pulse frequency was observed from the four-probe electrical conductivity measurement technique.